Photoelectron diffraction study of the surfaces of Si(111)root 3X root 3-Al and -In with Mo M-zeta and Cr L-alpha lines

Citation
S. Sumitani et al., Photoelectron diffraction study of the surfaces of Si(111)root 3X root 3-Al and -In with Mo M-zeta and Cr L-alpha lines, J ELEC SPEC, 103, 1999, pp. 245-250
Citations number
13
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
ISSN journal
03682048 → ACNP
Volume
103
Year of publication
1999
Pages
245 - 250
Database
ISI
SICI code
0368-2048(199906)103:<245:PDSOTS>2.0.ZU;2-F
Abstract
Laboratory X-ray sources of Mo M-zeta and Cr L-alpha lines were used for a photoelectron diffraction (PED) study of the well-documented surfaces of Si (111)root 3X root 3-Al and Si(111)root 3X root 3-In. Azimuthal angle PED pa tterns of Al 2p and In 3d core levels were measured and analyzed by a multi ple scattering formalism. The determined geometric parameters showed good a greement with those already established. This indicates the good potential of a FED study with laboratory sources. (C) 1999 Elsevier Science B.V. All rights reserved.