We present the design characteristics of an XUV undulator beamline for BESS
Y II, based on a spherical-grating monochromator for the energy range from
35-500 eV. The monochromator will use a moveable pre-mirror and a moveable
exit slit and has been optimized for highest resolution. For photon energie
s up to 200 eV a resolving power of 50 000 up to 80 000 should be achievabl
e, and for higher energies a resolving power of 20 000. All properties of t
he beamline have been extracted from ray-tracing calculations taking slope
errors as well as the characteristics of the source into account. (C) 1999
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