Design of the high-resolution BUS XUV-beamline for BESSY II

Citation
M. Martins et al., Design of the high-resolution BUS XUV-beamline for BESSY II, J ELEC SPEC, 103, 1999, pp. 965-969
Citations number
13
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
ISSN journal
03682048 → ACNP
Volume
103
Year of publication
1999
Pages
965 - 969
Database
ISI
SICI code
0368-2048(199906)103:<965:DOTHBX>2.0.ZU;2-4
Abstract
We present the design characteristics of an XUV undulator beamline for BESS Y II, based on a spherical-grating monochromator for the energy range from 35-500 eV. The monochromator will use a moveable pre-mirror and a moveable exit slit and has been optimized for highest resolution. For photon energie s up to 200 eV a resolving power of 50 000 up to 80 000 should be achievabl e, and for higher energies a resolving power of 20 000. All properties of t he beamline have been extracted from ray-tracing calculations taking slope errors as well as the characteristics of the source into account. (C) 1999 Elsevier Science B.V. All rights reserved.