Microstructural evolution of titanium nitride (TiN) coatings produced by reactive ion beam-assisted, electron beam physical vapor deposition (RIBA, EB-PVD)
De. Wolfe et J. Singh, Microstructural evolution of titanium nitride (TiN) coatings produced by reactive ion beam-assisted, electron beam physical vapor deposition (RIBA, EB-PVD), J MATER SCI, 34(12), 1999, pp. 2997-3006
Titanium nitride (TiN) coatings have been successfully deposited on 304 sta
inless steel substrates by reactive ion beam-assisted, electron beam-physic
al vapor deposition (RIBA, EB-PVD). The hardness values of the TiN coatings
varied from 800 to 2500 VHN depending on the processing condition. The lat
tice parameter and hardness variation were correlated with processing param
eters such as: deposition rate, bias, ion source energies, process gas, sub
strate temperature, and coating composition. The hardness of the TiN coatin
gs increased with increasing ion energy. The ion energies combined with the
deposition rate were the limiting factors controlling the degree of surfac
e texturing. Surface texturing was only observed for those coatings deposit
ed >8 Angstrom/s. (C) 1999 Kluwer Academic Publishers.