Microstructural evolution of titanium nitride (TiN) coatings produced by reactive ion beam-assisted, electron beam physical vapor deposition (RIBA, EB-PVD)

Citation
De. Wolfe et J. Singh, Microstructural evolution of titanium nitride (TiN) coatings produced by reactive ion beam-assisted, electron beam physical vapor deposition (RIBA, EB-PVD), J MATER SCI, 34(12), 1999, pp. 2997-3006
Citations number
58
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE
ISSN journal
00222461 → ACNP
Volume
34
Issue
12
Year of publication
1999
Pages
2997 - 3006
Database
ISI
SICI code
0022-2461(19990615)34:12<2997:MEOTN(>2.0.ZU;2-Y
Abstract
Titanium nitride (TiN) coatings have been successfully deposited on 304 sta inless steel substrates by reactive ion beam-assisted, electron beam-physic al vapor deposition (RIBA, EB-PVD). The hardness values of the TiN coatings varied from 800 to 2500 VHN depending on the processing condition. The lat tice parameter and hardness variation were correlated with processing param eters such as: deposition rate, bias, ion source energies, process gas, sub strate temperature, and coating composition. The hardness of the TiN coatin gs increased with increasing ion energy. The ion energies combined with the deposition rate were the limiting factors controlling the degree of surfac e texturing. Surface texturing was only observed for those coatings deposit ed >8 Angstrom/s. (C) 1999 Kluwer Academic Publishers.