Direct nitridation of aluminum compacts in low temperature and pressured nitrogen atmosphere

Citation
T. Okada et al., Direct nitridation of aluminum compacts in low temperature and pressured nitrogen atmosphere, J CERAM S J, 107(5), 1999, pp. 455-459
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE CERAMIC SOCIETY OF JAPAN
ISSN journal
09145400 → ACNP
Volume
107
Issue
5
Year of publication
1999
Pages
455 - 459
Database
ISI
SICI code
0914-5400(199905)107:5<455:DNOACI>2.0.ZU;2-1
Abstract
Complete nitridation of aluminum compacts was achieved at temperatures from 580 to 600 degrees C (lower than the melting point of aluminum) and under a pressured nitrogen atmosphere of 1 and 4 MPa. The structure of the genera ted aluminum nitride compact was strongly dependent of reaction condition. In the case of preheating in low vacuum or reaction under a low nitrogen pr essure, a rather uniform structure was generated. On the other hand, in the case pre-heating in high vacuum and reaction under a high nitrogen pressur e, the generated structure consisted of three layers: two dense outer layer s and a porous inner layer. Melting of aluminum was not observed during nit ridation when the uniform structure was generated, which suggests that the nitridation proceeded as a solid-gas reaction.