Physical structure of light-emitting porous polycrystalline silicon thin films

Citation
Pg. Han et al., Physical structure of light-emitting porous polycrystalline silicon thin films, MICROEL REL, 39(4), 1999, pp. 457-462
Citations number
14
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
39
Issue
4
Year of publication
1999
Pages
457 - 462
Database
ISI
SICI code
0026-2714(199904)39:4<457:PSOLPP>2.0.ZU;2-C
Abstract
This paper reports the surface electronic structure of light-emitting porou s polycrystalline silicon (PPS) using X-ray photoelectron spectroscopy (XPS ). We find that the PPS films with strong photoluminescence (PL) effect can only be observed in thin film with tract amount of silicon nanoclusters an d the luminescence can be enhanced remarkably with proper passivation of th e PPS surface, incomplete oxidation of silicon (Si3+ or Si2+) does not lead to visible FL. We further estimate that the avt rage size of silicon nanoc lusters is in the range of 20-30 Angstrom in the sample having PL emission. (C) 1999 Elsevier Science Ltd. All rights reserved.