STM STS studies of tungsten clusters on Si(111) surfaces using a newly developed deposition apparatus

Citation
N. Tanaka et N. Takeuchi, STM STS studies of tungsten clusters on Si(111) surfaces using a newly developed deposition apparatus, MICRON, 30(2), 1999, pp. 135-139
Citations number
10
Categorie Soggetti
Multidisciplinary
Journal title
MICRON
ISSN journal
09684328 → ACNP
Volume
30
Issue
2
Year of publication
1999
Pages
135 - 139
Database
ISI
SICI code
0968-4328(199904)30:2<135:SSSOTC>2.0.ZU;2-7
Abstract
Metallic tungsten (W) was deposited in a 2 x 10(-10) Ton vacuum onto clean Si(lll) surfaces with a 7 X 7 structure to produce size-controlled W cluste rs (quantum dots) on Si surfaces and to study the silicide-formation with c oncomitant change of electronic structure. The atomic structures, particula rly the first adsorption sites of W atoms, were studied by scanning tunneli ng microscopy (STM) and reflection high energy electron diffraction (RHEED) . The electronic structure, as represented by the density of states (DOS), was measured by scanning tunneling spectroscopy (STS). W atoms initially ad sorb onto the hollow sites of adatoms and dimer-atoms on the 7 X 7 structur e, and the W-clusters of 1.0-1.5 nm diameter are already metallic, as deduc ed from a comparison between the STS data and the DOS calculations using th e DV-X alpha method for W clusters composed of 23 atoms with a bcc structur e. (C) 1999 Elsevier Science Ltd. All rights reserved.