Ab initio structural predictions for ultrathin aluminum oxide films on metallic substrates

Citation
Dr. Jennison et al., Ab initio structural predictions for ultrathin aluminum oxide films on metallic substrates, PHYS REV B, 59(24), 1999, pp. R15605-R15608
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
59
Issue
24
Year of publication
1999
Pages
R15605 - R15608
Database
ISI
SICI code
0163-1829(19990615)59:24<R15605:AISPFU>2.0.ZU;2-L
Abstract
On several metallic substrates, first-principles density-functional calcula tions of Al2O3 5-7 Angstrom films predict a structure, stabilized by interf acial electrostatics, which has no bulk counterpart. In two and three O-lay er films, Al ions prefer distorted tetrahedral sites, over the normal octah edral sites. The film/substrate interface is found to consist of strongly c hemisorbed oxygen and is the determining factor in geometry; these oxygens are only weakly perturbed by the presence of Al2O3 overlayers. In an experi mentally relevant film (two O layers, as on NiAl), Al ions are nearly copla nar with surface O ions; thus observing "oxygen termination'' does not indi cate a polar surface. As a test case, we find Pt overlayers bind similarly as to alpha-Al2O3, suggesting these films may indeed be useful models for t hicker materials. [S0163-1829(99)50524-9].