Dr. Jennison et al., Ab initio structural predictions for ultrathin aluminum oxide films on metallic substrates, PHYS REV B, 59(24), 1999, pp. R15605-R15608
On several metallic substrates, first-principles density-functional calcula
tions of Al2O3 5-7 Angstrom films predict a structure, stabilized by interf
acial electrostatics, which has no bulk counterpart. In two and three O-lay
er films, Al ions prefer distorted tetrahedral sites, over the normal octah
edral sites. The film/substrate interface is found to consist of strongly c
hemisorbed oxygen and is the determining factor in geometry; these oxygens
are only weakly perturbed by the presence of Al2O3 overlayers. In an experi
mentally relevant film (two O layers, as on NiAl), Al ions are nearly copla
nar with surface O ions; thus observing "oxygen termination'' does not indi
cate a polar surface. As a test case, we find Pt overlayers bind similarly
as to alpha-Al2O3, suggesting these films may indeed be useful models for t
hicker materials. [S0163-1829(99)50524-9].