Formation mechanism and relative stability of the {11(2)over-bar-0} stacking fault atomic configurations in wurtzite (Al,Ga,In) nitrides

Citation
P. Ruterana et al., Formation mechanism and relative stability of the {11(2)over-bar-0} stacking fault atomic configurations in wurtzite (Al,Ga,In) nitrides, PHYS REV B, 59(24), 1999, pp. 15917-15925
Citations number
32
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
59
Issue
24
Year of publication
1999
Pages
15917 - 15925
Database
ISI
SICI code
0163-1829(19990615)59:24<15917:FMARSO>2.0.ZU;2-M
Abstract
The formation of the (1 (2) over bar 10) stacking fault, which has two atom ic configurations in wurtzite (Ga,Al,In)N, has been investigated by high-re solution electron microscopy and energetic calculations. It originates from steps at the SiC surface and it can form on a flat (0001) sapphire surface . A modified Stillinger-Weber potential is used in order to investigate the relative stability of the two atomic configurations which have comparable energy in AIN, whereas the 1/2[10 (1) over bar 1]{1 (2) over bar 10}atomic configuration should be more stable in GaN and InN. Experimental evidence i s shown in the case of AW and GaN from high-resolution electron microscopy. Observations carried out in plan-view show the 1/2[10 (1) over bar 1]{1 (2 ) over bar 10} atomic configuration in GaN layers. The 1/6[20 (2) over bar 3] configuration was found in small areas inside the AIN buffer layer in cr oss-section observations. It folds rapidly to the basal plane, and when bac k in the prismatic plane it bears the 1/2[10 (1) over bar 1]{1 (2) over bar 10} atomic configuration.