Atomically perfect bismuth lines on Si(001)

Citation
K. Miki et al., Atomically perfect bismuth lines on Si(001), PHYS REV B, 59(23), 1999, pp. 14868-14871
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B-CONDENSED MATTER
ISSN journal
01631829 → ACNP
Volume
59
Issue
23
Year of publication
1999
Pages
14868 - 14871
Database
ISI
SICI code
0163-1829(19990615)59:23<14868:APBLOS>2.0.ZU;2-G
Abstract
Atomically perfect bismuth lines form on Si(001) by a selective desorption process around the temperature at which most of the bismuth desorbs from bi smuth epitaxial layers. The lines are perpendicular to the silicon dimer ro ws; they are 1 nm wide and can be hundreds of nm long in a flat Si(001) sur face. They are utterly free of kinks or other defects. In our proposed mode l three silicon dimers in the surface are replaced with two Bi dimers, with a rebonded missing dimer defect between them. It is suggested that the lin es are straight because of kinetic reasons rather than thermodynamic ones - they form straight and are unable subsequently to kink.