Atomically perfect bismuth lines form on Si(001) by a selective desorption
process around the temperature at which most of the bismuth desorbs from bi
smuth epitaxial layers. The lines are perpendicular to the silicon dimer ro
ws; they are 1 nm wide and can be hundreds of nm long in a flat Si(001) sur
face. They are utterly free of kinks or other defects. In our proposed mode
l three silicon dimers in the surface are replaced with two Bi dimers, with
a rebonded missing dimer defect between them. It is suggested that the lin
es are straight because of kinetic reasons rather than thermodynamic ones -
they form straight and are unable subsequently to kink.