Texturing, surface energetics and morphology in the C49-C54 transformationof TiSi2

In this paper we analyse the extent of grain orientation before and after t he C49-C54 transformation in TiSi2;?, depending on the substrate microstruc ture and the lateral dimensions of the film. In the former case, for blanke t configuration, we make a comparison to the corresponding evolution in sur face roughness, both by AFM and by light scattering measurements. In the se cond case, an interpretation of the strong texturing occurring in narrow li nes, independently of substrate microstructure, is,given on the basis of su rface energy calculations. (C) 1999 Elsevier Science Ltd. All rights reserv ed.