Oriented thin films of p-nitrophenyl nitroxyl nitroxide radical

Citation
J. Fraxedas et al., Oriented thin films of p-nitrophenyl nitroxyl nitroxide radical, SYNTH METAL, 103(1-3), 1999, pp. 2298-2299
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SYNTHETIC METALS
ISSN journal
03796779 → ACNP
Volume
103
Issue
1-3
Year of publication
1999
Pages
2298 - 2299
Database
ISI
SICI code
0379-6779(199906)103:1-3<2298:OTFOPN>2.0.ZU;2-4
Abstract
Thin films (thickness similar to 2 mu m) of the molecular organic radical p -nitrophenyl nitroxyl nitroxide (p-NPNN) have been obtained by evaporating different crystallographic phases (alpha, beta and gamma) of the p-NPNN pre cursor in vacuum on glass and cleaved NaCl(001) substrates. The films cryst allize in the alpha-phase (monoclinic) and show a high degree of orientatio n of the c*-axis perpendicular to the substrate, independently of the precu rsor phase. The films undergo a spontaneous phase transition, from alpha to beta, under certain conditions.