Bias-stress induced instability of organic thin film transistors

Citation
M. Matters et al., Bias-stress induced instability of organic thin film transistors, SYNTH METAL, 102(1-3), 1999, pp. 998-999
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SYNTHETIC METALS
ISSN journal
03796779 → ACNP
Volume
102
Issue
1-3
Year of publication
1999
Pages
998 - 999
Database
ISI
SICI code
0379-6779(199906)102:1-3<998:BIIOOT>2.0.ZU;2-C
Abstract
We have investigated the stability of polythienylene vinylene field-effect transistors under gate bias stress. On time scales up to 1000 s and tempera tures up to 140 degrees C, we only observe reversible charge relaxation eff ects and no degradation. We show the time dependence of the threshold volta ge shift at different temperatures. Furthermore, we discuss the influence o f water and oxygen on the relaxation process.