Submicron photomanipulation of self-assembled polydiacetylenes

A new class of soluble, processable polydiacetylenes(PDA) derived from the alkoxycarbonylmethyl- and related urethanes of 9-(aryl-5,7-nonadiyn-1-ol ha s been designed and synthesized. The aryl groups used include N-methyl-anil ino, diphenylamino, and 9-carbazolyl. These PDA are susceptible to postpoly merization functionalization via the arylamine and ester groups. Examples o f the former include tricyanovinylation and;diazonium salt coupling; The la tter materials are the first rigid rod polymers to allow direct photofabric ation of regular surface relief gratings, as revealed by atomic force micro scopy(AFM).