Thin films of TTF-TCNQ were grown on KCl (001) substrates by Organic Chemic
al Vapor Deposition (OCVD). The experiments were carried out on a horizonta
l hot wall reactor using TTF and TCNQ as precursors and argon as carrier ga
s. The obtained films are polycrystalline, showing a different in-plane tex
ture depending on the substrate temperature. The electrical conductivity of
the films was studied by means of four-probe measurements.