Charge trapping instabilities of sexithiophene Thin Film Transistors

Citation
Wa. Schoonveld et al., Charge trapping instabilities of sexithiophene Thin Film Transistors, SYNTH METAL, 101(1-3), 1999, pp. 608-609
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SYNTHETIC METALS
ISSN journal
03796779 → ACNP
Volume
101
Issue
1-3
Year of publication
1999
Pages
608 - 609
Database
ISI
SICI code
0379-6779(199905)101:1-3<608:CTIOST>2.0.ZU;2-6
Abstract
The charge trapping instabilities of sexithiophene Thin Film Transistors oc curring during device operation, are studied as a function of time and temp erature. These charge trapping instabilities are characterised by a thresho ld voltage shift (Delta V-T) brought about by a stress voltage at the gate contact. The charge carrier mobility remains constant under bias stress and is independent on Delta V-T. The threshold shift is observed to be logarit hmically dependent on time. The decay rate of Delta V-T is thermally activa ted with an activation energy, which is similar to the activated behaviour of the charge carrier mobility, of about 89 meV. The nature of the charge t rapping instabilities is not known at this moment.