Thin oligomer films deposited in the presence of a hot wolfram filament.

Authors
Bernede, JC D'Almeida, K Taoudi, H Martinez, F Neculqueo, G Diaz, FR Del Valle, K Lefrant, S Molinie, P Louarn, G
Citation
Jc. Bernede et al., Thin oligomer films deposited in the presence of a hot wolfram filament., SYNTH METAL, 101(1-3), 1999, pp. 646-646
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SYNTHETIC METALS
ISSN journal
03796779 → ACNP
Volume
101
Issue
1-3
Year of publication
1999
Pages
646 - 646
Database
ISI
SICI code
0379-6779(199905)101:1-3<646:TOFDIT>2.0.ZU;2-3
Abstract
Thin oligomer films have been deposited by thermal evaporation under vacuum . A filament is placed between the evaporation source and the substrate, th e temperature of this filament has been used as parameter. It is shown that systematically an ESR signal appears when the filament is heated during th e deposition, while their is no signal after evaporation without filament.