Preparation and optical transmittance of titanium hydride (deuteride) films by rf reactive sputtering

Microstructure of the titanium hydride (deuteride) films prepared by rf rea ctive sputtering with Ar and H-2 (or D-2) gases were examined by X-ray diff raction measurements, scanning electron microscopy, Rutherford backscatteri ng spectrometry and elastic recoil detection analysis. In addition, their o ptical measurements were also carried out in visible and infra-red regions. It was found that the hcp Ti structure (alpha-TiHx) was mainly formed at h igh rf power. With decreasing rf power, however, the fee CaF2 structure (de lta-TiHx) was obtained. The films have a smooth surface at a short time of deposition for 1-10 min, and these films are used for optical measurements. The films show wide absorption over visible and infra-red regional althoug h the films include a large amount of O atoms, which may suggest the presen ce of the amorphous titanium oxide phase. (C) 1999 Elsevier Science S.A. Al l rights reserved.