New Cr-B hard coatings by r.f.-plasma assisted magnetron sputtering method

Cr-B thin films were synthesized by r.f.-plasma assisted magnetron sputteri ng method using pure CrB2 target on the quartz glass, glass ceramic and sta inless steel substrates. During the sputtering process, the selective sputt ering was observed. The influence of substrate temperature on the structure and properties of Cr-B thin films was investigated. The structure of all C r-B thin films was nanocrystal. With increasing the substrate temperature, the grain sizes became larger in a slow rate and the properties of Cr-B thi n films were also changed. New Cr-B thin films with high hardness and anti- oxidation properties were synthesized. (C) 1999 Elsevier Science S.A. All r ights reserved.