The (3 X 3) reconstruction and its evolution during the nitridation of GaAs(001)

Citation
J. Lu et al., The (3 X 3) reconstruction and its evolution during the nitridation of GaAs(001), THIN SOL FI, 344, 1999, pp. 567-570
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
344
Year of publication
1999
Pages
567 - 570
Database
ISI
SICI code
0040-6090(199904)344:<567:T(X3RA>2.0.ZU;2-H
Abstract
Nitridation of GaAs(001) was performed using a radio frequency nitrogen pla sma source in a molecular beam epitaxy chamber. The nitrogen-induced GaAs(0 01) (3 X 3) reconstruction was investigated by reflection high energy elect ron diffraction (RHEED) and X-ray photoemission spectroscopy (XPS). The tem perature dependence of the (3 X 3) reconstruction as well as its evolution during further nitridation was observed by RHEED; we found that the (3 X 3) reconstruction could be obtained in the temperature range 400-580 degrees C by a very low dose of atomic nitrogen deposition. The nitrogen coverage i n the (3 X 3) reconstruction is determined to be in the range 0.2-0.4 ML us ing XPS. We also discuss the atomic model of the (3 X 3) reconstruction and the energetics of its formation and stability. (C) 1999 Elsevier Science S .A. All rights reserved.