Effect of a ZnSe intralayer on the Si/Ge(111) heterojunction band offsets

Citation
M. Pan et al., Effect of a ZnSe intralayer on the Si/Ge(111) heterojunction band offsets, THIN SOL FI, 344, 1999, pp. 605-608
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
344
Year of publication
1999
Pages
605 - 608
Database
ISI
SICI code
0040-6090(199904)344:<605:EOAZIO>2.0.ZU;2-I
Abstract
Soft X-ray photoelectron spectroscopy (SXPS) was performed on Si/Ge(111)-c( 2 x 8) heterojunctions. The effect of an ordered ultrathin (one monolayer) ionic dipole layer of ZnSe placed at the interface was studied. The formati on of the interface was monitored via the evolution of the valence band edg es and the movements of core levels. It was found that the ZnSe intralayer dramatically modified the valence band offset of the Si/Ge(111) junction. T he Valence band offset was increased by 0.57 +/- 0.1 eV due to the presence of the ZnSe intralayer. This intralayer-induced modification of the valenc e band offset is interpreted in terms of the charge transfer at the interfa ce. (C) 1999 Elsevier Science S.A. All rights reserved.