The effect of hydrogen on the electronic properties of CVD diamond films

Citation
Hj. Looi et al., The effect of hydrogen on the electronic properties of CVD diamond films, THIN SOL FI, 344, 1999, pp. 623-626
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
344
Year of publication
1999
Pages
623 - 626
Database
ISI
SICI code
0040-6090(199904)344:<623:TEOHOT>2.0.ZU;2-B
Abstract
Thin film diamond, grown by chemical vapour deposition, have been found to display p-type surface conductivity. No bulk impurity is added to the films ; the p-type characteristics of the undoped diamond are thought to be due t o a surface or near surface hydrogenated layer. Carrier concentrations with in the range 10(17)-10(19) cm(-3) have been measured; control over the carr ier concentration can be achieved by annealing the 'as-grown' films in air. For a given annealing temperature a stable carrier concentration arises. T he Hall carrier mobility has been measured and a value of >70 cm(2)/Vs has been found for a film with a carrier concentration of similar to 5 x 10(17) cm(-3), the highest reported for polycrystalline thin film diamond and equ ivalent to boron doped single crystal diamond. I-V characteristics for Al-b ased Schottky diodes are good (ideality factor 1.1) and show no breakdown a t reverse bias levels greater than 100 V, suggesting this form of diamond i s well suited to electronic applications. (C) 1999 Elsevier Science S.A. AU rights reserved.