Trihalomethane formation potential prediction using some chemical functional groups and bulk parameters

Citation
Rp. Galapate et al., Trihalomethane formation potential prediction using some chemical functional groups and bulk parameters, WATER RES, 33(11), 1999, pp. 2555-2560
Citations number
18
Categorie Soggetti
Environment/Ecology
Journal title
WATER RESEARCH
ISSN journal
00431354 → ACNP
Volume
33
Issue
11
Year of publication
1999
Pages
2555 - 2560
Database
ISI
SICI code
0043-1354(199908)33:11<2555:TFPPUS>2.0.ZU;2-9
Abstract
This study was conducted to determine the influence of some chemical functi onal groups (COOH, phenolic-OH and organic nitrogen) and bulk parameters (U V 260 and DOC) on the trihalomethane formation potential (THMFP) of various treated industrial wastewaters. The samples were analyzed for UV 260, DOC, and THMFP. They were further fractionated into hydrophobic (humic) and hyd rophilic (nonhumic) fractions using the XAD-8 resin, then bulk and specific chemical functional groups were determined on both fractions. Regression a nalyses were carried out among the parameters analyzed with THMFP as the de pendent variable. The hydrophilic fractions contained higher DOC and had larger contribution to the bulk THMFP compared to the hydrophobic fractions. Simple regression analysis showed that although UV 260 and DOC correlated better with THMFP, the correlation values obtained were not statistically significant. Correla tions using bulk parameters as well as chemical functional groups taken one at a time could not predict THMFP. The parameters that influenced the form ation of THMs based on a stepwise and multiple regression analyses were UV 260, organic nitrogen, and phenolic-OH in the nonhumic fractions (hydrophil ic) and UV 260 and organic nitrogen in the humic fractions (hydrophobic). T he estimated THMFP obtained from the equation derived from the statistical analyses correlated significantly with the observed values at 99% level of confidence. (C) 1999 Elsevier Science Ltd. All rights reserved.