Synthesis and characterization of methylcyclopentadienyl-(eta(3)-allyl)platinum and its use as a metallo-organic chemical vapour deposition precursorof platinum

This communication reports on rapid, efficient synthesis of the metal-organ ic chemical vapor deposition (MOCVD) precursor (methylcyclopentadienyl)ally lplatinum. The compound is shown to be an effective precursor for the depos ition of platinum thin films giving deposits of high quality and purity, pr obably due to the nature of ligands which seems to be good leaving groups a s confirmed by mass spectrometric pathway, Copyright (C) 1999 John Wiley & Sons, Ltd.