The process of porous silicon, preparation from p-type Czochralski grown si
licon,CZ-Si, subjected to different preanneal proceses was studied. It was
found that defects generated by oxygen precipitation in the Ct-Si substrate
s can markedly influence the porous silicon preparation. Enhanced hydrostat
ic pressure of gas ambient during annealing of Ct-Si at 1350 degrees C lead
s to the generation of some extended defects in Ct-Si which affect photolum
inescence from porous silicon obtained from such substrates. A relation bet
ween the concentration of defects in the Ct-Si substrates and the porous si
licon structure and its photoluminescence was observed. Dependence of photo
luminescence and porous silicon structure on the kind and concentration of
oxygen related defects in the Ct-Si substrate was found.