A comparative study of radiation damage on high resistivity silicon

Citation
P. Mangiagalli et al., A comparative study of radiation damage on high resistivity silicon, EPJ-APPL PH, 6(2), 1999, pp. 121-130
Citations number
42
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
ISSN journal
12860042 → ACNP
Volume
6
Issue
2
Year of publication
1999
Pages
121 - 130
Database
ISI
SICI code
1286-0042(199905)6:2<121:ACSORD>2.0.ZU;2-0
Abstract
In future particle accelerators, silicon detectors will be exposed with lar ge doses of different types of radiation. To understand the corresponding p roduced damage mechanisms, a systematic study of the influence of the irrad iation on the silicon from which the detectors are made has to be carried o ut. Samples of low n-doped silicon (n less than or equal to 10(12) cm(-3)) have been irradiated with swift krypton ions ((E) = 5.2 GeV), neutrons from a nuclear reactor ((E) similar to 1 MeV) and energetic electrons ((E) = 1. 5 MeV). Resistivity and Hall effect measurements performed after irradiatio n show that the silicon is changed to a quasi-intrinsic state, characterize d by a very high resistivity. The electrically active defects responsible f or that evolution are mainly acceptor centers, namely divacancy and/or vaca ncy-doping complexes. Besides, for the highest fluences, only the appearanc e of a donor center located at about 0.59 eV below the conduction band may explain the observed stabilization of the Fermi level at 0.61 eV. Finally, using a simulation method, the rates of generation of the different defects are estimated.