THICK-FILM PHENOMENON IN HIGH-HEAT-FLUX EVAPORATION FROM CYLINDRICAL PORES

Citation
D. Khrustalev et A. Faghri, THICK-FILM PHENOMENON IN HIGH-HEAT-FLUX EVAPORATION FROM CYLINDRICAL PORES, Journal of heat transfer, 119(2), 1997, pp. 272-278
Citations number
19
Categorie Soggetti
Engineering, Mechanical",Thermodynamics
Journal title
ISSN journal
00221481
Volume
119
Issue
2
Year of publication
1997
Pages
272 - 278
Database
ISI
SICI code
0022-1481(1997)119:2<272:TPIHEF>2.0.ZU;2-D
Abstract
A physical and mathematical model of the evaporating thick liquid film , attached to the liquid-vapor meniscus in a circular micropore, has b een developed. The liquid pow has been coupled with the vapor flow alo ng the liquid-vapor interface. The model includes quasi-one-dimensiona l compressible steady-state momentum conservation for the vapor and al so a simplified description of the microfilm at the end of the thick f ilm. The numerical results, obtained for water, demonstrate that forma tion of extended thick liquid films in micropores can take place due t o high-velocity vapor flow under high rates of vaporization. The model has also predicted that the available capillary pressure significantl y changes with the wall-vapor superheat and other operational conditio ns.