Surface reduction of ruthenium compounds with long exposure to an X-ray beam in photoelectron spectroscopy

Citation
P. Froment et al., Surface reduction of ruthenium compounds with long exposure to an X-ray beam in photoelectron spectroscopy, J ELEC SPEC, 104(1-3), 1999, pp. 119-126
Citations number
25
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
ISSN journal
03682048 → ACNP
Volume
104
Issue
1-3
Year of publication
1999
Pages
119 - 126
Database
ISI
SICI code
0368-2048(199907)104:1-3<119:SRORCW>2.0.ZU;2-J
Abstract
The reduction of Ru at the surface of commercial RuCl3 and RuO2 has been ob served during XPS analysis. The experiments have been performed with either a non-monochromatized (Mg K-alpha) or a monochromatized (Al K-alpha) X-ray beam. Ruthenium reduction is enhanced by increasing the X-ray dose, but th e residual pressure exerts only a weak influence. The initial composition o f commercial ruthenium (III) chloride hydrate is a complex mixture of chlor o or chlorohydroxo species rather than pure RuCl3. nH(2)O. RuCl3 is not sui table as a reference compound for ruthenium chloride compounds in XPS analy sis, because it contains mainly Ru(IV) which is reduced under X-ray. A simi lar reduction occurs at the surface of RuO2 samples (by reduction of RuO3 l ayers), and on the adventitious carbon. (C) 1999 Elsevier Science B.V. All rights reserved.