P. Froment et al., Surface reduction of ruthenium compounds with long exposure to an X-ray beam in photoelectron spectroscopy, J ELEC SPEC, 104(1-3), 1999, pp. 119-126
Citations number
25
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
The reduction of Ru at the surface of commercial RuCl3 and RuO2 has been ob
served during XPS analysis. The experiments have been performed with either
a non-monochromatized (Mg K-alpha) or a monochromatized (Al K-alpha) X-ray
beam. Ruthenium reduction is enhanced by increasing the X-ray dose, but th
e residual pressure exerts only a weak influence. The initial composition o
f commercial ruthenium (III) chloride hydrate is a complex mixture of chlor
o or chlorohydroxo species rather than pure RuCl3. nH(2)O. RuCl3 is not sui
table as a reference compound for ruthenium chloride compounds in XPS analy
sis, because it contains mainly Ru(IV) which is reduced under X-ray. A simi
lar reduction occurs at the surface of RuO2 samples (by reduction of RuO3 l
ayers), and on the adventitious carbon. (C) 1999 Elsevier Science B.V. All
rights reserved.