A study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications

Authors
Lim, CW Bourdillon, AJ Gong, H Lahiri, SK Pey, KL Lee, KH
Citation
Cw. Lim et al., A study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications, J MAT SCI L, 18(9), 1999, pp. 743-746
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
18
Issue
9
Year of publication
1999
Pages
743 - 746
Database
ISI
SICI code
0261-8028(19990501)18:9<743:ASOTEO>2.0.ZU;2-4