Nitrogen K-edge EXAFS measurements on Mg- and Si-doped GaN

Citation
M. Katsikini et al., Nitrogen K-edge EXAFS measurements on Mg- and Si-doped GaN, J SYNCHROTR, 6, 1999, pp. 555-557
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF SYNCHROTRON RADIATION
ISSN journal
09090495 → ACNP
Volume
6
Year of publication
1999
Part
3
Pages
555 - 557
Database
ISI
SICI code
0909-0495(19990501)6:<555:NKEMOM>2.0.ZU;2-2
Abstract
Prior to the analysis, the EXAFS spectra were normalised to the flux of the monochromator by division with the electron yield spectrum from a clean Si wafer. The normalised EXAFS spectra were subjected to subtraction of the a tomic absorption using the AUTOBK program (Mustre de Leon et al., 1991). Th e spectra were corrected for self-absorption effects in the k space using t he procedure described previously (Katsikini et al., 1997). A model for hex agonal GaN (a=3.18 Angstrom, c=5.168 Angstrom) was constructed using the FE FF6 code (Mustre de Leon et al., 1991). The initial values for the Debye-Wa ller (BW) factors were calculated using the correlated Debye model (Sevilla no et al., 1979) and a Debye temperature of 600K.