Poly(hexadiene-1,3 sulfone), PHS, is a polymer which has demonstrated poten
tial as an X-ray resist material for microfabrication based on X-ray lithog
raphy. Sulfur K-edge XANES measurements were performed on PHS after various
dosages of exposure to synchrotron-generated X-rays to assess the role of
sulfur atoms in the degradation. The effects of irradiation are assessed an
d compared to those in poly(butene-1 sulfone), PBS, a commercially used e-b
eam resist.