Management of TEOS LPCVD process effluents

TEOS LPCVD processes tend to clog the vacuum pumping foreline with effluent byproducts that can increase particle levels, impede gas flow, and cause c atastrophic pump failure. An integrated effluent management solution involv es the correct combination of a nitrogen boundary layer near the inner phys ical wall of the pump line, optimized pump line temperature, and a turbulen t-flow trap. Depending on the installation, the hardware upgrade payback ti me can be less than three weeks, and in some severe cases less than three d ays.