Growth of carbon nickel multilayer for X-ray-UV optics by RF reactive magnetron sputtering

Amorphous C/Ni superlattice films designed as normal-incidence reflector fo r 5 nm have been grown on float-glass substrates by magnetron sputter depos ition in Ar discharge. A comprehensive set of characterization techniques h as been applied: grazing X-ray reflection (0.154 nm), atomic force microsco py and transmission electron microscopy in order to determine the quality o f the structure. By comparing the results, it could be concluded that RF-ma gnetron sputtering technique is a good choice for growing such layered synt hetic microstructures. (C) 1999 Elsevier Science B.V. All rights reserved.