Large area silicon drift detectors, consisting of 8 mm and 12 mm diameter h
exagons, were fabricated on 0.35 mm thick high resistivity n-type silicon.
An external FET and a low-noise charge sensitive preamplifier were used for
testing the prototype detectors. The detector performance was measured in
the range -75 ts 25 degrees C using Peltier cooling, and from 0.125 to 6 mu
s amplifier shaping time. Measured energy resolutions were 159 eV FWHM and
263 eV FWHM for the 0.5 cm(2) and 1 cm(2) detectors, respectively (at 5.9
keV, -75 degrees C, 6 Cls shaping time). The uniformity of the detector res
ponse over the entire active area (measured using 560 nm light) was < 0.5 %
.