A novel three degree-of-freedom micropositioner was developed for deep ultr
aviolet lithography applications. The design of the micropositioner utilize
s the monolithic flexural mechanism with the built-in multilayer piezoelect
ric actuators and the sensors to achieve the translations in the X- and Y-a
xes and rotation in the theta(z)-axis. The compact design aims at high reso
lution, high stiffness, and extremely low crosstalk interference. Parametri
c analyses of harmonic and forced vibrations are conducted to solve the der
ived dynamic models for the near optimum geometry of the micropositioner. F
urthermore, the error budget analysis is conducted to minimize the effects
of the geometric tolerance, material variation, and hysteresis errors.