Absolute measurement of thermophysical and optical thin-film properties byphotothermal methods for the investigation of laser damage

Citation
E. Welsch et al., Absolute measurement of thermophysical and optical thin-film properties byphotothermal methods for the investigation of laser damage, INT J THERM, 20(3), 1999, pp. 965-976
Citations number
27
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
INTERNATIONAL JOURNAL OF THERMOPHYSICS
ISSN journal
0195928X → ACNP
Volume
20
Issue
3
Year of publication
1999
Pages
965 - 976
Database
ISI
SICI code
0195-928X(199905)20:3<965:AMOTAO>2.0.ZU;2-7
Abstract
Perspectives and limits of the application of the photothermal technique ar e given for the measurement of absorption, thermal, and thermoelastic prope rties in thin films. The peculiarities of this technique in the frequency a nd time domains are discussed in some detail, and selected important result s with respect to laser damage studies in optical coatings are pointed out. Emphasis is placed on the absolute measurement of both optical and thermop hysical properties in dielectric materials in thin-film form and, also, on the influence of both absorption and changed thermal properties in thin fil ms on their thermally induced laser damage resistance.