Zj. Zhang et al., A crystalline hydrogenated carbon film obtained by plasma enhanced chemical vapor deposition, J APPL PHYS, 86(3), 1999, pp. 1317-1321
A hydrogenated carbon film in a crystalline form has been prepared on Si (0
01) using a radio frequency plasma enhanced chemical vapor deposition proce
ss. The crystalline film is metastable and has polymer-like features with a
mass density of about 1.20 g/cm(3) and an optical band gap of about 2.75 e
V. The stability of the structure and properties of the film was studied by
thermal annealing at successively higher temperatures in the air. Upon hea
ting, the film showed a two-step structure change which resulted in a two-s
tep change in the film properties. The relationship between the properties
and the bonded hydrogen in the film was also discussed. (C) 1999 American I
nstitute of Physics. [S0021-8979(99)05715-1].