A crystalline hydrogenated carbon film obtained by plasma enhanced chemical vapor deposition

Citation
Zj. Zhang et al., A crystalline hydrogenated carbon film obtained by plasma enhanced chemical vapor deposition, J APPL PHYS, 86(3), 1999, pp. 1317-1321
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
3
Year of publication
1999
Pages
1317 - 1321
Database
ISI
SICI code
0021-8979(19990801)86:3<1317:ACHCFO>2.0.ZU;2-Q
Abstract
A hydrogenated carbon film in a crystalline form has been prepared on Si (0 01) using a radio frequency plasma enhanced chemical vapor deposition proce ss. The crystalline film is metastable and has polymer-like features with a mass density of about 1.20 g/cm(3) and an optical band gap of about 2.75 e V. The stability of the structure and properties of the film was studied by thermal annealing at successively higher temperatures in the air. Upon hea ting, the film showed a two-step structure change which resulted in a two-s tep change in the film properties. The relationship between the properties and the bonded hydrogen in the film was also discussed. (C) 1999 American I nstitute of Physics. [S0021-8979(99)05715-1].