Citation
Cjm. Van Rijn et al., Microsieves made with laser interference lithography for micro-filtration applications, J MICROM M, 9(2), 1999, pp. 170-172
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
ISSN journal
09601317
→ ACNP
Volume
9
Issue
2
Year of publication
1999
Pages
170 - 172
Database
ISI
SICI code
0960-1317(199906)9:2<170:MMWLIL>2.0.ZU;2-R
Abstract
A microsieve with a very uniform pore size of 260 nm and a pore to pore spa
cing of 510 nm has been fabricated using multiple exposure interference lit
hography and (silicon) micro-machining technology.
The sieve consists of a 0.1 mu m thick silicon nitride membrane perforated
with sub-micron diameter pores and a macro perforated silicon support. The
calculated clean water flux is at least one to two orders higher than that
of conventional inorganic membranes.