Carbon films have been deposited on Al2O3(0001) substrates by sputtering a
graphite target with 3 keV CH4+, N+, and Ar+ ions. The structure and proper
ties of the films were examined by Auger electron spectrometry, micro-Raman
spectroscopy, and optical absorption measurement, and were found to be dep
endent on which sputtering ions were used. The stability of the carbon film
s was also examined using Fourier-transformed infra-red spectroscopy by ann
ealing the films at temperatures from 25 to 200 degrees C.