Growth and characterization of Ba0.6Sr0.4TiO3 thin films on Si with Pt electrodes

Citation
L. Kinder et al., Growth and characterization of Ba0.6Sr0.4TiO3 thin films on Si with Pt electrodes, J VAC SCI A, 17(4), 1999, pp. 2148-2150
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
4
Year of publication
1999
Part
2
Pages
2148 - 2150
Database
ISI
SICI code
0734-2101(199907/08)17:4<2148:GACOBT>2.0.ZU;2-8
Abstract
Both metalorganic chemical vapor deposition and pulsed laser deposition hav e been used to grow Ba0.6Sr0.4TiO3 (BST) thin films on Si with Pt electrode s. The smoother Pt electrodes allow the BST to:grow with greater crystallin ity. Thin Nm Pt/BST/Pt capacitors with a dielectric thickness Of around 170 nm show dielectric constants over 400 and dielectric losses in the range o f 0.01-0.03 at 10 kHz. The electric/dielectric properties of the BST films are further improved by first depositing a 27 nm BST seed layer by metalorg anic chemical vapor deposition followed by a 145 nm BST layer deposited by pulsed laser deposition. (C) 1999 American Vacuum Society. [S0734-2101(99)0 3404-1].