Recent progress in the functionalization of atomic force microscope probesusing electron-beam nanolithography

Authors
Zhou, H Mills, G Chong, BK Midha, A Donaldson, L Weaver, JMR
Citation
H. Zhou et al., Recent progress in the functionalization of atomic force microscope probesusing electron-beam nanolithography, J VAC SCI A, 17(4), 1999, pp. 2233-2239
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
4
Year of publication
1999
Part
2
Pages
2233 - 2239
Database
ISI
SICI code
0734-2101(199907/08)17:4<2233:RPITFO>2.0.ZU;2-N
Abstract
We present recent work in which direct-write electron-beam lithography has been used to fabricate near-field optical, thermal and magnetic sensors. Ke y fabrication issues affecting the performance of these probes are discusse d and recent fabrication results are presented. (C) 1999 American Vacuum So ciety. [S0734-2101(99)15004-8].