Dt. Carpenter et al., Low-magnification quantitative X-ray mapping of grain-boundary segregationin aluminum-4 wt.% copper by analytical electron microscopy, MICROS MICR, 5(4), 1999, pp. 254-266
Quantitative X-ray mapping in the analytical electron microscope (AEM) coul
d improve the statistics of grain-boundary segregation measurements if high
spatial resolution can be maintained at lower magnifications (<500 WC), Ty
pically, only about 10 boundaries are analyzed because of the difficulty of
conventional AEM measurements; however, a low-magnification quantitative X
-ray map could contain twice this number of boundaries in a single field of
view. Microscope conditions and mapping parameters have been explored for
operation at similar to 250 kX, under a variety of conditions to illustrate
the trade-offs between various characteristics, such as analytical resolut
ion, counting statistics, magnification, and acquisition time. From these d
ata, it is possible to extrapolate to maps generated under different condit
ions and estimate their limitations with respect to these characteristics.
A simple model has been developed to describe the behavior of inclined grai
n boundaries that can be used to estimate the detectability of segregant as
a function of boundary tilt Using quantitative X-ray maps, grain boundary
Cu coverage has been measured from 55 boundaries in Al-4 wt.% Cu with minim
al user effort. For fine-grained thin films, mapping is substantially more
efficient than other methods of data acquisition and may be used to measure
segregation at large numbers of boundaries.