Cd. Beling et al., POSITRON DEEP-LEVEL TRANSIENT SPECTROSCOPY - A NEW APPLICATION OF POSITRON-ANNIHILATION TO SEMICONDUCTOR PHYSICS, Applied surface science, 116, 1997, pp. 121-128
Citations number
15
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Recent positron mobility and lifetime measurements made on ac-biased m
etal on semi-insulating GaAs junctions, which have identified the nati
ve EL2 defect through a determination of the characteristic ionization
energy of the donor level, are reviewed. It is shown that these measu
rements point towards a new spectroscopy, tentatively named positron-D
LTS (deep level transient spectroscopy), that is the direct complement
to conventional DLTS in that it monitors transients in the electric f
ield of the depletion region rather than the inversely related depleti
on width, as deep levels undergo ionization. In this new spectroscopy,
which may be applied to doped material by use of a suitable positron
beam, electric field transients are monitored through the Doppler shif
t of the annihilation radiation resulting from the drift velocity of t
he positron in the depletion region. Two useful extensions of the new
spectroscopy beyond conventional capacitance-DLTS are suggested. The f
irst is that in some instances information on the microstructure of th
e defect causing the deep level may be inferred from the sensitivity o
f the positron to vacancy defects of negative and neutral charge state
s. The second is that the positron annihilation technique is intrinsic
ally much faster than conventional DLTS with the capability of observi
ng transients some 10(6) times faster, thus allowing deep levels (and
even shallow levels) to be investigated without problems associated wi
th carrier freeze-out.