POSITRON BEAM ANALYSIS OF SEMICONDUCTOR-MATERIALS USING A 2-DETECTOR DOPPLER BROADENING COINCIDENCE SYSTEM

Citation
Ac. Kruseman et al., POSITRON BEAM ANALYSIS OF SEMICONDUCTOR-MATERIALS USING A 2-DETECTOR DOPPLER BROADENING COINCIDENCE SYSTEM, Applied surface science, 116, 1997, pp. 192-197
Citations number
7
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
116
Year of publication
1997
Pages
192 - 197
Database
ISI
SICI code
0169-4332(1997)116:<192:PBAOSU>2.0.ZU;2-3
Abstract
Doppler-broadening measurements can be improved by using a second Ge-d etector for the coincidence detection of the second annihilation photo n. The coincidence condition in combination with an energy relation re sults in a reduction of the background by a factor of 100 compared to a single detector system. This background reduction opens up the possi bility of performing accurate measurements of the high momentum part o f Doppler-broadened annihilation spectra. We have used this technique for the analysis of a metal oxide semiconductor system and electron-ir radiated. As- and Sb-doped silicon.