THE STUDY OF MULTILAYERS FE HF AND NI/HF BY SLOW POSITRON BEAM TECHNIQUE/

Authors
TASHIRO M NAKAJYO T MURASHIGE Y KOIZUMI T KANAZAWA I KOMORI F SOE WH YAMAMOTO R ITO Y
Citation
M. Tashiro et al., THE STUDY OF MULTILAYERS FE HF AND NI/HF BY SLOW POSITRON BEAM TECHNIQUE/, Applied surface science, 116, 1997, pp. 263-267
Citations number
16
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
116
Year of publication
1997
Pages
263 - 267
Database
ISI
SICI code
0169-4332(1997)116:<263:TSOMFH>2.0.ZU;2-#
Abstract
The S-parameters versus the incident positron energy are measured in t he Ni/Hf multilayer, thin Hf film, thin Fe film and the bilayer Fe/Hf. We have analyzed the change in vacancy-type defects in these multilay ers and thin films with the deposition temperature in the MBE system.