The photoelectric characteristics of silicon metal-insulator-semiconductor
switching structures are investigated; cerium, dysprosium, and erbium fluor
ides are used for the insulator layer. It is shown that the photoelectric c
haracteristics of the structures in the low-resistance state are similar to
those of a metal-(tunneling insulator)-semiconductor structure; in particu
lar, a mechanism of injection amplification of the photocurrent comes into
play. (C) 1999 American Institute of Physics. [S1063-7826(99)00807-8].