White wafer treatment using organically tailored heulandite minerals

Citation
Sc. Bouffard et Sjb. Duff, White wafer treatment using organically tailored heulandite minerals, TAPPI J, 82(7), 1999, pp. 178-184
Citations number
23
Categorie Soggetti
Material Science & Engineering
Journal title
TAPPI JOURNAL
ISSN journal
07341415 → ACNP
Volume
82
Issue
7
Year of publication
1999
Pages
178 - 184
Database
ISI
SICI code
0734-1415(199907)82:7<178:WWTUOT>2.0.ZU;2-Q
Abstract
Heulandite aggregates were tailored with hexadecyltrimethylammonium (HDTMA) cations for treatment of TMP closed-cycle white waters. Over a range of mi neral concentrations of 1.2-350 kg/m(3) and a pH range of 5-7, the HDTMA la yer on the mineral surface preferentially removed low-molecular-weight subs tances as a result of the size selectivity exerted by HDTMA-tailored minera ls. These substances included fatty acids and resin acids. Because only the external surfaces of the mineral particles were accessed, large mineral do ses were required to remove most of the resin and fatty acids from closed-c ycle white water Work is continuing on finding ways to reduce the mineral d ose required.