K. Itakura et al., Effect of deposition site condition on the initial growth process of electroless CoNiP films, ELECTR ACT, 44(21-22), 1999, pp. 3707-3711
Effect of deposition site condition on the growth process of electroless Co
NiP films was investigated by employing the intermediate 'treatment' step d
uring the deposition. The effect of chemical species in the bath on the dep
osition sites, i.e., the film growth process, was examined using scanning e
lectron microscopy (SEM) and atomic force microscopy (AFM). By changing the
pH of the solutions for the 'treatment' step, it was found that the 'treat
ment' with higher pH solution resulted in the formation of smaller grains w
hich possess lower perpendicular coercivity, Hc(perpendicular to). From the
se results, ammonia in the deposition bath results in the inhibition of the
growth of crystallites, which leads lower Hc(perpendicular to). Based upon
this, a model of the growth process of the CoNiP films was proposed. (C) 1
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