Effect of deposition site condition on the initial growth process of electroless CoNiP films

Citation
K. Itakura et al., Effect of deposition site condition on the initial growth process of electroless CoNiP films, ELECTR ACT, 44(21-22), 1999, pp. 3707-3711
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
44
Issue
21-22
Year of publication
1999
Pages
3707 - 3711
Database
ISI
SICI code
0013-4686(1999)44:21-22<3707:EODSCO>2.0.ZU;2-D
Abstract
Effect of deposition site condition on the growth process of electroless Co NiP films was investigated by employing the intermediate 'treatment' step d uring the deposition. The effect of chemical species in the bath on the dep osition sites, i.e., the film growth process, was examined using scanning e lectron microscopy (SEM) and atomic force microscopy (AFM). By changing the pH of the solutions for the 'treatment' step, it was found that the 'treat ment' with higher pH solution resulted in the formation of smaller grains w hich possess lower perpendicular coercivity, Hc(perpendicular to). From the se results, ammonia in the deposition bath results in the inhibition of the growth of crystallites, which leads lower Hc(perpendicular to). Based upon this, a model of the growth process of the CoNiP films was proposed. (C) 1 999 Elsevier Science Ltd. All rights reserved.