Modifications and characterization of a silicon-based microelectrode array

A silicon-based microelectrode array for a wide variety of applications has been developed, This microelectrode array represents a well-suited alterna tive to current methods of chemical analysis and is useful in order to stud y and optimize effects such as material corrosion, etching processes and di fferent passivation layers. Microelectrodes with a high aspect ratio for sp ace-resolved measurements and an integrated energy supply could be realized by galvanic deposition. The used passivation layers were characterized by scanning electron microscopy (SEM), optical microscopy and small area X-ray photoelectron spectroscopy (XPS). The electrodes have been investigated by SEM, cyclic voltammetry and laser profilometry. (C) 1999 Elsevier Science Ltd. All rights reserved.