G. Carchon et al., Characterising differences between measurement and calibration wafer in probe-tip calibrations, ELECTR LETT, 35(13), 1999, pp. 1087-1088
A general method to compensate for differences in probe-tip-to-line geometr
y and substrate permittivity between measurements and the calibration wafer
is presented. The propagation constant, characteristic impedance and param
eters of a general lumped-element equivalent discontinuity model are extrac
ted at each frequency point based on measurements of two lines with differe
nt lengths.