Surface dynamics dominate the temporal variation of reflection high energy
electron diffraction (RHEED) intensity in the low temperature molecular bea
m epitaxy (MBE) of (100) gallium arsenide (GaAs). A rate equation model is
proposed which includes the presence and dynamics of a physisorbed arsenic
(PA) layer riding the growth surface. Using the results of the temporal evo
lution of the surface, the RHEED intensity is computed based on kinematical
theory of electron diffraction with an As-As interplanar distance of 2.48
Angstrom, for the physisorbed As layer and a (100) Ga-As crystalline interp
lanar distance of 1.41 Angstrom. The model results show ROs at low and high
temperatures but not in the intermediate range of 300-450 degrees C which
is in good agreement with experiments. At low temperatures, the surface is
covered by the PA layer whose vertical distribution across the layers depen
ds upon that of the underlying crystalline surface. Thus a temporal variati
on of the step density of the crystalline GaAs surface results in step dens
ity variation of the PA layer which, in turn, yields ROs. Since the height
of the PA layer is uniformly 2.48 Angstrom in this case, the RHEED beam see
s a step height; equal to the GaAs interplanar distance of 1.41 Angstrom, a
nd the specular intensity of the RHEED beam will respond to the temporal va
riations in the underlying GaAs surface, yielding ROs if the growth is laye
r-by-layer. At high temperatures the crystalline GaAs is exposed to the RHE
ED beam due to evaporation of PA layer and the ROs appear due to periodic s
tep density oscillations with a step height of 1.41 Angstrom which is the G
a-As crystalline interplanar distance. At intermediate temperatures, the pa
rtial coverage of the surface by the PA layer and crystalline GaAs, coupled
with very different interplanar distances in these layers, results in a co
mplete destructive interference of the RHEED intensity. The RO dependence o
n the As BEP is also presented and discussed.